Our Systems Catalog

system 1


- Main Chamber Size: 17" x 22"
- Sputtering Sources: 7 magnetron sources with in-situ tilt
- Two AJA 750W DC
- Shimadzu 1080 l/s magnetically levitated compound turbopump
- Two AJA RF (100W and 300W)
- One Pinnacle Plus 5k pulsed DC

Plassys E-Beam deposition system

Key Features

- 8x 15cc crucibles
- Thin film evaporation of metals with electron beam
- 10 keV electron beam energy, 10 kW power
- Cryo pumped load lock and main chamber
- Substrates up to 100 mm
- Substrate rotation and tilt
- Full computer control

AJA Orion5 Sputtering System

Key Features

- 5 guns 2”
- 2DC and 2RF power supply
- substrate bias and heating
- 2 process gases
- Load lock and a fully automated process with computer Software Phase II

System 1

Pfeiffer pumping station

Price: $4890

Ultimate pressure < 10-8mbar.

Pfeiffer pumping station
System 1

TMU 261 with 6" conflat

Price: $2890

Ultimate pressure ~e-8 to e-10 mbar

Pfeiffer TMU 261
System 1

Price: $4440

AT6 matching network, 600 W and MC2 Seren tunner

Kurt J. Lesker AT6 600W (matching network and tuner)
System 1

Price: $250 each unit

A low-noise, bipolar output, +/- 0.1C

ILX lightwave LDT-5412 Thermoelectric Temperature Controller
System 1

Price: $95

0-30 V, 0-10A

Wayne Kerr Autoranging power supply LS30-10